Home News Helium ion microscope creates new window on (sub)nano-structured surfaces
30 oktober 2009
Helium ion microscope creates new window on (sub)nano-structured surfaces
At TNO NanoLab NL in Delft, the first ORION® PLUS Helium ion microscope in Europe is now operational. Helium ion microscopy, developed by Carl Zeiss SMT, is a new and very accurate surface characterization technique that allows direct viewing and surface analysis of (sub-) nanometer structures. The instrument is accessible for the scientific community and commercial users. With this new microscope TNO and Carl Zeiss SMT have extended their cooperation in a project on the demonstration and development of the Scanning Helium Ion Microscope (SHIM).
Currently, TNO and Carl Zeiss SMT cooperate in the development of extremely clean optics for the newest generations of wafer steppers by ASML, which are applied for EUV and immersion lithography. The partners have decided to enable metrology and inspection for the next step in lithography by investing in a Helium Microscope (SHIM), which extends the range of current Scanning Electron Microscopes (SEM) down to (sub-) nanometer structures.
SHIM for materials science and semiconductor industry
In SEM, the primary beam exists of electrons. On nanometer scale, this beam becomes blurred as it is ‘smeared’ over the surface. In contrast, the new microscope technique SHIM deploys helium ions. These are much heavier and therefore less easily smeared. This allows for much sharper images and more detailed information on the composition of the topmost layer. The nanoscale information that SHIM can deliver is important in materials science and semiconductor industry. For instance, in the production of integrated circuits and chips, it is crucial to be able determine structure size and shape precisely. The smallest structures currently made are 45 nm and cannot be imaged exactly by SEM. SHIM is able to do this imaging much more exact and will be able to do so for at least three of four generations of even smaller integrated structures. Other applications are in high-tech coatings, catalyst particles and nano-additives.
Faster and sharper imaging
As a first step in their cooperation, TNO and Carl Zeiss SMT will enhance SHIM to allow faster and sharper imaging. Later on, the SHIM may also be used to fabricate nanostructures. It is expected that the sub-nanometer focus of the helium ion beam will allow for the production of very small structures, be it at a low production rate. The ability to fabricate and image structures in one instrument without losing spatial information is extremely tempting for nanotechnology, opening new windows on surfaces with a view on the (sub-)nanometer scale.
Currently, TNO and Carl Zeiss SMT cooperate in the development of extremely clean optics for the newest generations of wafer steppers by ASML, which are applied for EUV and immersion lithography. The partners have decided to enable metrology and inspection for the next step in lithography by investing in a Helium Microscope (SHIM), which extends the range of current Scanning Electron Microscopes (SEM) down to (sub-) nanometer structures.